TOC Removal System for High-Purity Water Applications

In ultra-pure water networks, the sum of all organic molecules is called Total Organic Carbon (TOC). A TOC Removal System is a specialized technology designed for post-treatment to lower organic compounds to single digits (parts per billion - ppb).

Standard multi-stage filtration systems are effective at removing minerals and ions, but trace organics can slip through standard reverse osmosis membranes. The unchecked growth of bacteria caused by undetected organic carbon can result in surface defects during semiconductor production, and contaminate high precision laboratory analysis such as chromatography. Smooth integration of an automated removal plant guarantees maximum compliance with rigid fluid standards.

Advanced Photochemical Oxidation Processes

A professional TOC Removal System primarily relies on advanced photochemical oxidation processes to systematically destroy stubborn carbon chains without adding extra process steps:

• 185 nm UV Photo-Oxidation: The 185 nm short wave germicidal UV lamps produce high-energy UV radiation that directly breaks water molecules. The reaction produces highly active hydroxyl free radicals ($OH^-$) which attack organics and convert them to non-toxic carbon dioxide ($CO_2$) and water.
• Catalytic Polishing Beds: Ionic by-products formed in the first stage of the UV photo-oxidation process are removed by Catalytic Polishing Beds (CPB) downstream, filled with nuclear-grade mixed-bed ion exchange resins.
• Ultrafiltration (UF) Polishing: A final line of defense to remove trace organics and pyrogens, securing water parameters before point-of-use distribution.